Aligned pipe arrays formation by silicon anodic etching
نویسندگان
چکیده
منابع مشابه
Fabrication and Optical Characterization of Silicon Nanostructure Arrays by Laser Interference Lithography and Metal-Assisted Chemical Etching
In this paper metal-assisted chemical etching has been applied to pattern porous silicon regions and silicon nanohole arrays in submicron period simply by using positive photoresist as a mask layer. In order to define silicon nanostructures, Metal-assisted chemical etching (MaCE) was carried out with silver catalyst. Provided solution (or materiel) in combination with laser interference lithogr...
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Department of Physics and Materials Scien Chee Avenue, Kowloon Tong, Kowloon, Hon Department of Biology and Chemistry, Cit Avenue, Kowloon Tong, Kowloon, Hong Kon Centre for Functional Photonics (CFP), Cit Avenue, Kowloon Tong, Kowloon, Hong Kon Shenzhen Research Institute, City Universit † Electronic supplementary informa 10.1039/c4ra06172a ‡ These authors contributed equally to th Cite this: ...
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The hyperbolic and plasmonic properties of silicon nanowire/Ag arrays have been investigated. The aligned nanowire arrays were formed and coated by atomic layer deposition of Ag, which itself is a metamaterial due to its unique mosaic film structure. The theoretical and numerical studies suggest that the fabricated arrays have hyperbolic dispersion in the visible and IR ranges of the spectrum. ...
متن کاملfabrication and optical characterization of silicon nanostructure arrays by laser interference lithography and metal-assisted chemical etching
in this paper metal-assisted chemical etching has been applied to pattern porous silicon regions and silicon nanohole arrays in submicron period simply by using positive photoresist as a mask layer. in order to define silicon nanostructures, metal-assisted chemical etching (mace) was carried out with silver catalyst. provided solution (or materiel) in combination with laser interference lithogr...
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ژورنال
عنوان ژورنال: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
سال: 1998
ISSN: 0734-211X
DOI: 10.1116/1.590136